To inquire about use or collaboration, please contact Prof. Strandwitz unless otherwise noted.
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Thermal ALD: Ultratech Cambridge Nanotech Savannah 100 Atomic Layer Deposition System
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Thermal ALD: Custom Thermal Atomic Layer Deposition system for in situ analysis
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HS-LEIS: High Sensitivity Low Energy Ion Scattering for surface analysis (shared facility)
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XPS: Scienta X-Ray Photoelectron Spectroscopy ESCA (shared facility)
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X-ray diffractometer: Panalytical Empyrean with variety of x-ray optics and DHS 1100 heated stage (shared facility)
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Glovebox: Innovative Technologies Inert Atmosphere glovebox (N2) with a quartz window
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Solar cell simulation system: Broadband (1 sun) and spectral analysis
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DC and AC electrical testing system: Keithley 2450 and HP 4194A with a probe station
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Thermal Processing: 1 inch and 2 inch tube furnaces with inert/air/oxygen/vacuum atmospheres (up to 1100 °C)
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Potentiostats: Two Gamry potentiostats for electrochemical analysis, I1000 and Reference 600 systems
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Spectroscopic Ellipsometer: J.A. Woolam VASE Ellipsometer (shared instrument, housed in Chemistry Dept)
Other Shared Facilities and Research Groups at Lehigh
- Electron Microscopy Facility
- Nanofabrication Facilities and Cleanroom (Center for Photonics and Nanoelectronics)
- MOCVD growth facility (Center for Photonics and Nanoelectronics)
- MOCVD and NanoPhotonics Group (Prof. N. Tansu)
- Lehigh Tribology Laboratory (Prof. B.A. Krick)
Thermal ALD: Ultratech Cambridge Nanotech Savannah 100 Atomic Layer Deposition System
Thermal ALD system with deposition temperatures from 80-300 °C. Metal precursors currently available for Al, Hf, Si, and Ti, along with several oxygen precursors including H2O and O2/O3. Several chemistries for molecular layer deposition are also available.
Thermal ALD: Custom Thermal Atomic Layer Deposition System for in situ Analysis
Custom-built (2016) thermal atomic layer deposition system with a large chamber for in situ film modification and analysis. Currently under further development.
HS-LEIS: High Sensitivity Low Energy Ion Scattering
Qtac100 from IonTof. A variety of probe ions, sample preparation conditions, and depth profiling are available for compositional analysis of the outermost atomic layer and depth (nm scale) of materials. Available for internal and external/industrial users. Contact Henry Luftman, hsl212 at lehigh.edu
XPS: Scienta X-ray Photoelectron Spectrometer
More info soon. Available for internal and external/industrial users. Contact Henry Luftman, hsl212 at lehigh.edu
XRD: Panalytical Empyrean X-Ray Diffraction System
Purchased in 2016, a highly versatile diffraction tool capable of measuring powders, bulk solids, and thin films. Available for internal and external/industrial users. Three incident beam optics include a Bragg Brentano HD mirror, a hybrid 2-bounce Ge monochromator, and a fixed slit holder. Diffracted beam optics include a fixed slit holder and parallel plate collimator (for grazing incidence XRD, GiXRD, and X-ray reflectivity, XRR). Pixel 3D area detector enables ultrafast measurements. DHS 1100 heated stage enables in situ heating up to 1100 °C in an inert atmosphere, air, or vacuum. Several software packages are available including Highscore (powder analysis), Epitaxy, and Stress. Files for Lehigh Users HERE.
